Lookbook

Description

Onde-print semi-sheer dress PUCCI is renowned for its use of statement patterns, as seen with this high-neck dress. Cut in Italy to a semi-sheer design, it's emblazoned with the Onde motif in a black and grey colourway. Highlights - Black/grey - Geometric-pattern print - Semi-sheer construction - High neck - Sleeveless - Rear slit - Ankle-length Made in Italy Composition Nylon 100%

Product details provided by: FARFETCH

Product IDs

REVERSIBLE ID

664552711

Brand style ID

3UTI013U758